| Application: |
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| Dry film or liquid photoresist |
One-sided or two-sided exposure |
| Registration: |
|
| Active registration system alignment tolerance: |
Programmable tolerance |
| |
Four Point Process Deviation position optimization algorithm |
| |
Accuracy +/- 10 microns (0.0004") "best fit" |
| Camera alignment of top image, bottom image, and panel front-to-back registration. |
|
| Image to panel alignment: |
Align to holes |
| |
Align to etched pattern |
| |
Align to laser etched or skived pattern |
| Image front-to-back-to-panel |
Align to holes |
| |
Align to etched pattern |
| |
Align to laser etched or skived pattern |
| Non-registered index and print mode. |
|
| Exposure Source: |
|
| OLEC Point Source Optics or Hybrid Collimation. |
|
| Double-sided exposure. |
|
Two 8 kW three level light units. Selectable low (2.5 kW),
medium (4 kW) and high power (8 kW.) |
(5kW-three level exposure systems available on request) |
| Interchangeable optics optimized for speed or resolution. |
|
| Three available spectral output lamps |
|
| Lamp change time typically 5 minutes per lamp |
|
| Standard uniformity +/- 10% |
|
| Exposure control, light integration, integrator range |
0 to 9999 units, selectable – digital calibration to mJ/cm2 |
| Production rate from 120 – 240 exposures/hour |
|
| Exposure Frame: |
|
| Glass Tooling |
Configured for image size range and artwork size |
| |
10 mm high transmission glass |
| Image Capacity (typical configuration) |
Full image size 610mm x 711mm (24" x 28") |
| |
Larger sizes are available |
| Soft contact 8-12 inches of Hg, monitored and alarmed |
Artwork setup time < 3 minutes |
